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TSMC revealing details about next gen A14 node

109 pointsby osnium123last Tuesday at 3:31 PM45 commentsview on HN

Abstract at IEDM website below

ABSTRACT

A14 NanoFlexTM Pro platform technology features the world’s smallest SRAM with a cell size <0.017μm2 and highest SRAM macro density to date through dimensional ground rule scaling. Coupled with standard cell innovations, it delivers a full-node PPA improvement over the predecessor N2 technology for a 10~15% speed enhancement, a 25~30% power reduction and a chip density increase by ~20% driven by logic and SRAM scaling. Key features, such as TSV, innovative RDL that enables SoIC bond pitch of 4.5μm and high-performance MiM processes, have also been developed to accelerate the system-level integration and scaling for SoIC products. Supported by robust yield and device progress, A14 technology is on track for volume production in 2028.


Comments

aurareturnlast Wednesday at 6:33 AM

Chip density increase is slowing down. Since N10, density scaling has been 60-80%. N3 to N2 is only 20%. And now N2 to A14 is also only 20%.

show 5 replies
moeadhamyesterday at 10:10 PM

I can’t believe we’re talking Angstroms already.

show 1 reply
JumpCrisscrossyesterday at 7:46 PM

TSMC: https://www.tsmc.com/english/dedicatedFoundry/technology/log...

Not sure what this source is, but it looks sketchy.

show 2 replies
nwah1last Tuesday at 6:37 PM

In simpler terms, the SRAM density improved by 2.9% (according to ChatGPT). Which is better than it sounds, because SRAM had reached a wall, in terms of density gains, and, chips can be dominated by SRAM in terms of surface area, so this can mean a lot more room for logic, even though that is also getting considerably denser.

ginkoyesterday at 7:17 PM

Come on we're in the 21st century, UTF-8 is pervasive. Just call it "Å14" node.

show 3 replies
osnium123last Tuesday at 3:31 PM

Abstract at IEDM website below

ABSTRACT A14 NanoFlexTM Pro platform technology features the world’s smallest SRAM with a cell size <0.017μm2 and highest SRAM macro density to date through dimensional ground rule scaling. Coupled with standard cell innovations, it delivers a full-node PPA improvement over the predecessor N2 technology for a 10~15% speed enhancement, a 25~30% power reduction and a chip density increase by ~20% driven by logic and SRAM scaling. Key features, such as TSV, innovative RDL that enables SoIC bond pitch of 4.5μm and high-performance MiM processes, have also been developed to accelerate the system-level integration and scaling for SoIC products. Supported by robust yield and device progress, A14 technology is on track for volume production in 2028.

show 1 reply
facelosslast Tuesday at 7:46 PM

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surcap526last Tuesday at 6:25 PM

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